Chemical bath deposition

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The Chemical bath deposition (CBD) method is one of the cheapest methods to deposit thin films and nanomaterials, as it does not depend on expensive equipment and is a scalable technique that can be employed for large area batch processing or continuous deposition. In 1933 Bruckman deposited Lead(II) sulfide (PbS) thin film by chemical bath deposition (CBD) or solution grown method.[1]

Advantages and disadvantages[edit]

The major advantage of CBD is that it requires only solution containers and substrate mounting devices. The one drawback of this method is the wastage of solution after every deposition. Among various deposition techniques, chemical bath deposition yields stable, adherent, uniform and hard films with good reproducibility by a relatively simple process. The chemical bath deposition method is one of the suitable methods for preparing highly efficient thin films in a simple manner. The growth of thin films strongly depends on growth conditions, such as duration of deposition, composition and temperature of the solution, and topographical and chemical nature of the substrate.

Reaction Mechanism[edit]

The chemical bath deposition involves two steps, nucleation and particle growth, and is based on the formation of a solid phase from a solution. In the chemical bath deposition procedure, the substrate is immersed in an aqueous solution containing the precursors.

References[edit]

  1. ^ Chemical Bath Bruckman