File:7nm Metal by SID.png

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7nm_Metal_by_SID.png(601 × 320 pixels, file size: 7 KB, MIME type: image/png)

Summary

Description A 7nm node metal layer can be patterned by two masks with the Spacer-is-Dielectric (SID) approach. Here the blue pattern indicates the core pattern defined by a first mask, while the red locations are where the spacer gap-fill material is deposited following the spacer patterning (not shown). The yellow pattern is the block pattern defined by the second mask, to complete the overall pattern. Ref.: US Patent 8312494, assigned to Synopsys.
Date
Source Excel drawing
Author Guiding light

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Guiding light at English Wikipedia, the copyright holder of this work, hereby publishes it under the following licenses:
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Original upload log

The original description page was here. All following user names refer to en.wikipedia.
Date/Time Dimensions User Comment
2017-07-27 12:45:40 601 × 320 Guiding light
2017-07-27 06:23:07 466 × 211 Guiding light
2017-07-27 05:05:55 466 × 211 Guiding light Uploading a self-made file using [[Wikipedia:File_Upload_Wizard|File Upload Wizard]]

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27 July 2017

image/png

a21b77ec7067c79fe4ed970f2f97e7ac076dac13

7,095 byte

320 pixel

601 pixel

File history

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Date/TimeThumbnailDimensionsUserComment
current02:19, 13 May 2018Thumbnail for version as of 02:19, 13 May 2018601 × 320 (7 KB)OgreBot(BOT): Reverting to most recent version before archival
02:19, 13 May 2018Thumbnail for version as of 02:19, 13 May 2018466 × 211 (3 KB)OgreBot(BOT): Uploading old version of file from en.wikipedia; originally uploaded on 2017-07-27 06:23:07 by Guiding light
02:18, 13 May 2018Thumbnail for version as of 02:18, 13 May 2018466 × 211 (2 KB)OgreBot(BOT): Uploading old version of file from en.wikipedia; originally uploaded on 2017-07-27 05:05:55 by Guiding light
21:27, 11 May 2018Thumbnail for version as of 21:27, 11 May 2018601 × 320 (7 KB)Willy1018Transferred from en.wikipedia (MTC!) (1.1.0)
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