English: For different pattern pitches, the angles of incidence for the customized EUV illumination of a 4x magnified pattern mask are plotted. The angle of incidence is defined using the general grating formalism as shown, for example, in http://epswww.unm.edu/xrd/xrdclass/05-Diffraction-Basics.pdf. The 6 degree central ray defines the plane of incidence.
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