Hafnium(IV) silicate

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Hafnium(IV) silicate
PubChem 17979268
ChemSpider 16470992 YesY
Jmol-3D images Image 1
Molecular formula HfO4Si
Molar mass 270.57 g mol−1
Except where noted otherwise, data are given for materials in their standard state (at 25 °C (77 °F), 100 kPa)
Infobox references

Hafnium silicate is the hafnium(IV) salt of silicic acid with the chemical formula of HfSiO4.

Thin films of hafnium silicate and zirconium silicate produced by chemical vapor deposition, most often MOCVD, can be used as a high-k dielectric as a replacement for silicon dioxide in semiconductors.