Mattson Technology

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Mattson Technology Inc
Industry Semiconductor equipment and materials
Founded 1988
Headquarters Fremont, California, United States
Key people

Fusen Ernie Chen (Chief Executive Officer, President, and Director)
J. Michael Dodson (Chief Financial Officer, Chief Operating Officer)

Tyler Purvis (Chief Accounting Officer)(Dec 2012)
Products Dry Strip, Rapid Thermal Processing, Etch
Revenue $ 119.43M (Dec 31, 2013)

Mattson Technology Inc(NASDAQ:MTSN) is an American company which was set up in 1988 and now is based in Fremont, California. The company is both a manufacturer and supplier in the market of semiconductor equipment globally. Its main products are dry strip system, rapid thermal processing, and etch. The company provide products for customers, such as foundries, memory and logic device manufacturers.[1][2]

Products and services[edit]

The company’s major products are semiconductor wafer processing equipments are used in the fabrication of integrated circuits (ICs). Its dry strip products (SUPREMA) incorporates its Faraday shielded inductively coupled plasma (ICP) radio frequency source and platform used in the production at the 65 nanometer node and below. In addition, its rapid thermal processing (RTP) products (Helios, Helios XP and Millios) are used in annealing applications. These products use dual-sided, lamp-based heating technology to control the chip manufacturing. Its etch products (paradigmE and Alpine) with a combination of Faraday-shielded ICP and etch bias control for on-wafer performance. Etching is the process of removing any deposited materials or layers from the wafer's surface to create the desired pattern on the wafer's surface.[2]

Research and development[edit]

Mattson Technology is one of the leader in the dry strip market and is the second largest supplier of RTP products. There are several important technology widely used in its products, namely 45 nm transition; (Etch) Alpine, paradigm Si; (Strip) SUPREMA, SUPREMA XP5; (TPG) Helios, Helios XP, Millios.[3]

In December 2013, Mattson Technology announced its paradigmE XP, next-generation etch system, extending the company's etch technology and enabling chipmakers to address processing challenges for leading-edge, three-dimensional semiconductor manufacturing. This new system has been qualified in Nov. by advanced DRAM device technologies.[4]


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