Plasma processing

From Wikipedia, the free encyclopedia
Jump to: navigation, search

Plasma processing is a plasma-based material processing technology that aims at modifying the chemical and physical properties of a surface.

Plasma processing techniques include:

Related topics are plasma chemistry, chemical vapor deposition, and physical vapor deposition processes like sputter deposition, plasma ion doping, vacuum plasmaspraying, and reactive ion etching.

[edit] See also

Personal tools
Namespaces
Variants
Actions
Navigation
Interaction
Toolbox
Print/export
Languages