Trichlorosilane

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Trichlorosilane
Identifiers
CAS number 10025-78-2 YesY
PubChem 24811
ChemSpider 23196 YesY
EC number 233-042-5
UN number 1295
RTECS number VV5950000
Jmol-3D images Image 1
Properties
Molecular formula HCl3Si
Molar mass 135.45 g·mol-1
Appearance colourless liquid
Density 1.342 g/cm3
Melting point

−126.6 °C

Boiling point

31.8 °C

Solubility in water hydrolysis
Hazards
MSDS ICSC 0591
EU Index 014-001-00-9
EU classification Highly flammable (F+)
Harmful (Xn)
Corrosive (C)
R-phrases R12, R14, R17, R20/22, R29, R35
S-phrases (S2), S7/9, S16, S26, S36/37/39, S43, S45
NFPA 704
NFPA 704.svg
4
3
2
W
Flash point −27 °C
Autoignition
temperature
185 °C
Explosive limits 1.2–90.5%
Related compounds
Related chlorosilanes Chlorosilane
Dichlorosilane
Dichloromethylsilane
Chlorodimethylsilane
Silicon tetrachloride
Related compounds Trifluorosilane
Tribromosilane
Chloroform
 YesY (verify) (what is: YesY/N?)
Except where noted otherwise, data are given for materials in their standard state (at 25 °C, 100 kPa)
Infobox references

Trichlorosilane is a chemical compound containing silicon, hydrogen, and chlorine. At high temperatures, it decomposes to produce silicon, and therefore purified trichlorosilane is the principal source of ultrapure silicon in the semiconductor industry. In water, it rapidly decomposes to produce a silicone polymer while giving off hydrochloric acid. Because of its reactivity and wide availability, it is frequently used in the synthesis of silicon-containing organic compounds.

Contents

[edit] Production

Industrially, trichlorosilane is produced by blowing hydrogen chloride through a bed of silicon powder at 300°C. There, they combine to make trichlorosilane and hydrogen according to the chemical equation

Si + 3 HCl → HSiCl3 + H2

A properly designed reactor can achieve a yield of 80-90% trichlorosilane. The major byproducts are silicon tetrachloride (chemical formula SiCl4), hexachlorodisilane (Si2Cl6), and dichlorosilane (H2SiCl2), from which trichlorosilane can be separated by distillation.

The reverse process is used in the production of silicon of higher purity.

[edit] Application

Trichlorosilane is the basic ingredient used in the production of purified polysilicons.

[edit] References

[edit] External links

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