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Illustration of a Duoplasmatron

The Duoplasmatron is an ion source in which a cathode filament emits electrons into a vacuum chamber.[1] A gas such as argon is introduced in very small quantities into the chamber, where it becomes charged or ionized through interactions with the free electrons from the cathode, forming a plasma. The plasma is then accelerated through a series of at least two highly charged grids, and becomes an ion beam, moving at fairly high speed from the aperture of the device.


The duoplasmatron was invented by Manfred von Ardenne.[2] Later development by Harold R. Kaufman resulted in the Kaufman Duoplasmatron which has been used for applications as diverse as semiconductor manufacture, and spacecraft propulsion.[citation needed]


  1. ^ Bernhard Wolf (31 August 1995). Handbook of Ion Sources. CRC Press. pp. 47–. ISBN 978-0-8493-2502-1.
  2. ^ J. M. Walls (1990). Methods of Surface Analysis: Techniques and Applications. CUP Archive. pp. 27–. ISBN 978-0-521-38690-6.

Further reading[edit]

  • Brown, I.G., "The Physics and Technology of Ion Sources", Wiley-VCH (2004), p. 110

External links[edit]