Titanium disilicide

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Titanium disilicide[1]
IUPAC name
Titanium disilicide
Other names
Titanium silicide
12039-83-7 N
Jmol interactive 3D Image
PubChem 6336889
Molar mass 104.038 g/mol
Appearance black orthorhombic crystals
Density 4.02 g/cm3
Melting point 1,470 °C (2,680 °F; 1,740 K)
Solubility soluble in HF
Related compounds
Other cations
Zirconium disilicide
Hafnium disilicide
Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa).
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Infobox references

Titanium disilicide (TiSi2) is an inorganic chemical compound.

Titanium silicide is used in the semiconductor industry. It is typically grown by means of salicide technology over silicon and polysilicon lines to reduce the sheet resistance of local transistors connections. In the microelectronic industry it is typically used in the C54 phase.


  1. ^ Lide, David R. (1998), Handbook of Chemistry and Physics (87 ed.), Boca Raton, FL: CRC Press, pp. 4–91, ISBN 0-8493-0594-2