|Jmol interactive 3D||Image|
|Molar mass||104.038 g/mol|
|Appearance||black orthorhombic crystals|
|Melting point||1,470 °C (2,680 °F; 1,740 K)|
|Solubility||soluble in HF|
Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa).
|what is ?)(|
Titanium silicide is used in the semiconductor industry. It is typically grown by means of salicide technology over silicon and polysilicon lines to reduce the sheet resistance of local transistors connections. In the microelectronic industry it is typically used in the C54 phase.
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