|This article does not cite any sources. (July 2013) (Learn how and when to remove this template message)|
It is used in microelectronics as a contact material, for conductive layers, and barrier layers between silicon and other metals, e.g. tungsten or copper. It is less commonly used than titanium nitride or tungsten films.
Tungsten silicide is another material with similar use.
|This material-related article is a stub. You can help Wikipedia by expanding it.|