Duoplasmatron

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The Duoplasmatron is an ion source in which a cathode filament emits electrons into a vacuum chamber.[1] A gas such as argon is introduced in very small quantities into the chamber, where it becomes charged or ionized through interactions with the free electrons from the cathode, forming a plasma. The plasma is then accelerated through a series of at least two highly charged grids, and becomes an ion beam, moving at fairly high speed from the aperture of the device.

History[edit]

The duoplasmatron was invented by Manfred von Ardenne.[2] Later development by Harold R. Kaufman resulted in the Kaufman Duoplasmatron which has been used for applications as diverse as semiconductor manufacture, and spacecraft propulsion.[citation needed]

References[edit]

  1. ^ Bernhard Wolf (31 August 1995). Handbook of Ion Sources. CRC Press. pp. 47–. ISBN 978-0-8493-2502-1. 
  2. ^ J. M. Walls (1990). Methods of Surface Analysis: Techniques and Applications. CUP Archive. pp. 27–. ISBN 978-0-521-38690-6. 

Further reading[edit]

  • Brown, I.G., "The Physics and Technology of Ion Sources", Wiley-VCH (2004), p.110

External links[edit]