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- lithography". In Montgomery, M. Warren; Maurer, Wilhelm (eds.). Photomask Technology 2010. Vol. 7823. SPIE. pp. 78231C. doi:10.1117/12.868485. S2CID 109918356...7 KB (590 words) - 02:43, 5 October 2024
- "Direct write electron beam lithography: A historical overview". Photomask Technology 2010. 7823. Bibcode:2010SPIE.7823E..16P. doi:10.1117/12.868477. S2CID 108646584...58 KB (6,445 words) - 02:12, 12 September 2024