Search results

Etching is used in microfabrication to chemically remove layers from the surface of a wafer during manufacturing. Etching is a critically important process...

Reactive-ion etching (RIE) is an etching technology used in microfabrication. RIE is a type of dry etching which has different characteristics than wet etching. RIE...

Dry etching refers to the removal of material, typically a masked pattern of semiconductor material, by exposing the material to a bombardment of ions...

to use gas as plasma etching is hydrogen plasma etching. Therefore, an experimental apparatus like this can be used: A plasma etcher, or etching tool,...

Etching is traditionally the process of using strong acid or mordant to cut into the unprotected parts of a metal surface to create a design in intaglio...

Deep reactive-ion etching (DRIE) is a special subclass of reactive-ion etching (RIE). It enables highly anisotropic etch process used to create deep penetration...

annealing. Surface cleaning may be performed by sputter-etching, chemical etching, reactive gas etching or ion milling. For example, the native oxide of silicon...

may be in liquid-, gas- or plasma-phase, although liquid etchants such as buffered hydrofluoric acid (BHF) for silicon dioxide etching are more often used...

In reactive-ion etching (RIE), the substrate is placed inside a reactor, and several gases are introduced. A plasma is struck in the gas mixture using an...

traumatic experiences in many subsequent works, including a portfolio of fifty etchings called Der Krieg, published in 1924. Subsequently, he referred to the war...

Atomic layer etching (ALE) is an emerging technique in semiconductor manufacture, in which a sequence alternating between self-limiting chemical modification...

Vapor etching refers to a process used in the fabrication of Microelectromechanical systems (MEMS) and Nanoelectromechanical systems (NEMS). Sacrificial...

holds two U.S. patents related to field-effect device manufacturing and gas etching. In 1990, Corrigan testified before the United States House Committee...

modern devices and technologies, such as plasma televisions or plasma etching. Depending on temperature and density, a certain number of neutral particles...

ion etching (RIE). Other methods for forming a similar structure include electrochemical etching, stain etching, metal-assisted chemical etching, and...

Metal Assisted Chemical Etching (also known as MACE) is the process of wet chemical etching of semiconductors (mainly silicon) with the use of a metal...

sputtering with an inert gas is called ion milling or ion etching. Sputtering can also play a role in reactive-ion etching (RIE), a plasma process carried...

plasma etching, the PTFE is exposed to plasma, an electrically charged gas. Various gases may be used to generate the plasma. Like chemical etching, plasma...

treasure has been estimated at upwards of 16,000 paintings, drawings, etchings and sculptures: 1,000 pieces by Nolde, 700 by Haeckel, 600 each by Schmidt-Rottluff...

compound with the formula (NF 3). It is a colorless, non-flammable, toxic gas with a slightly musty odor. In contrast with ammonia, it is nonbasic. It...