File:5nm cuts and vias.png
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Summary
| Description |
English: 5nm cuts (top) and vias (bottom) are simplified with wire pairing. Cuts and vias are allocated to alternate wire pairs, which can be spaced apart by a single immersion lithography exposure in the vertical direction. Double patterning is still applied here in the horizontal direction (for 40 nm pitch), but wire pairing for the next metal layer may relieve this as well. Reference: S-Y. Han et al., "Delay-driven Layer Assignment for Advanced Technology Nodes," ASP-DAC 2017. |
| Date | |
| Source | Excel drawing |
| Author | Guiding light |
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| Date/Time | Dimensions | User | Comment |
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| 02:00, 18 March 2018 | 380 × 813 (12,267 bytes) | w:en:Guiding light (talk | contribs) | |
| 23:35, 17 March 2018 | 380 × 784 (11,198 bytes) | w:en:Guiding light (talk | contribs) | Uploading a self-made file using [[Wikipedia:File_Upload_Wizard|File Upload Wizard]] |
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 02:28, 7 October 2018 | | 380 × 813 (12 KB) | OgreBot | (BOT): Reverting to most recent version before archival |
| 02:28, 7 October 2018 |  | 380 × 784 (11 KB) | OgreBot | (BOT): Uploading old version of file from en.wikipedia; originally uploaded on 2018-03-17 23:35:14 by Guiding light | |
| 15:14, 29 September 2018 |  | 380 × 813 (12 KB) | Arlene the bean | Transferred from en.wikipedia: see original upload log above |
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