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Journal of High Technology Law

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This is an old revision of this page, as edited by Notecardforfree (talk | contribs) at 16:44, 29 November 2016 (Updated W&L ranking info). The present address (URL) is a permanent link to this revision, which may differ significantly from the current revision.

Journal of High Technology Law
DisciplineTechnology law
LanguageEnglish
Edited byDoug Mondell
Publication details
History2002-present
Publisher
FrequencyBiannually
Standard abbreviations
ISO 4J. High Tech. L.
Indexing
ISSN1536-7983
LCCN2001215552
OCLC no.56209148
Links

The Journal of High Technology Law is one of five law journals at Suffolk University Law School publishing articles and book reviews covering subjects related to technology law. It was established in 1998 and became the Law School's fourth honor board law journal in 2001.[1] In Washington and Lee University's 2016 rankings of law journals with the highest impact factor, the journal was ranked 18th among law journals specializing in Science, Technology and Computing, and was ranked 215th among all United States law journals.[2]

References

  1. ^ "About the Journal of High Technology Law". Retrieved 2008-05-26.
  2. ^ Washington and Lee University School of Law, accessed November 29, 2016.