Ion beam deposition: Difference between revisions
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[[file:ion implanter schematic.png|thumb|Ion beam deposition setup with mass separator]] |
[[file:ion implanter schematic.png|thumb|Ion beam deposition setup with mass separator]] |
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An ion beam deposition apparatus typically consists of an ion source, ion optics, and the deposition target. Optionally a mass analyzer can be incorporated.<ref>{{Citation |last=Stout |first=D. A. |title=5 - Synthesis of carbon based nanomaterials for tissue engineering applications |date=2013-01-01 |url=https://www.sciencedirect.com/science/article/pii/B9780857095961500055 |work=Nanomaterials in Tissue Engineering |pages=119–157 |editor-last=Gaharwar |editor-first=A. K. |access-date=2023-12-10 |series=Woodhead Publishing Series in Biomaterials |publisher=Woodhead Publishing |isbn=978-0-85709-596-1 |last2=Durmus |first2=N. G. |last3=Webster |first3=T. J. |editor2-last=Sant |editor2-first=S. |editor3-last=Hancock |editor3-first=M. J. |editor4-last=Hacking |editor4-first=S. A.}}</ref> |
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An ion beam deposition apparatus typically consists of an ion source, ion optics, and the deposition target. Optionally a mass analyzer can be incorporated. |
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In the [[ion source]] source materials in the form of a gas, an evaporated solid, or a solution (liquid) are ionized. For atomic IBD, [[electron ionization]], field ionization ([[Penning ion source]]) or [[cathodic arc]] sources are employed. Cathodic arc sources are used particularly for [[carbon]] ion deposition. Molecular ion beam deposition employs [[electrospray ionization]] or [[MALDI]] sources. |
In the [[ion source]] source materials in the form of a gas, an evaporated solid, or a solution (liquid) are ionized. For atomic IBD, [[electron ionization]], field ionization ([[Penning ion source]]) or [[cathodic arc]] sources are employed.{{Citation needed|date=December 2023}} Cathodic arc sources are used particularly for [[carbon]] ion deposition. Molecular ion beam deposition employs [[electrospray ionization]] or [[MALDI]] sources.<ref name=":0">{{Citation |last=Li |first=Wuxia |title=Ion Beam Instruments Used for Nanomanufacturing |date=2013 |url=https://doi.org/10.1007/978-1-4471-4976-7_63-4 |work=Handbook of Manufacturing Engineering and Technology |pages=1–22 |editor-last=Nee |editor-first=Andrew |access-date=2023-12-10 |place=London |publisher=Springer |language=en |doi=10.1007/978-1-4471-4976-7_63-4 |isbn=978-1-4471-4976-7 |last2=Gu |first2=Changzhi}}</ref> |
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The ions are then accelerated, focused or deflected using high voltages or magnetic fields. Optional deceleration at the substrate can be employed to define the deposition energy. This energy usually ranges from a few [[Electronvolt|eV]] up to a few keV. At low energy molecular ion beams are deposited intact (ion soft landing), while at a high deposition energy molecular ions fragment and atomic ions can penetrate further into the material, a process known as [[ion implantation]]. |
The ions are then accelerated, focused or deflected using high voltages or magnetic fields. Optional deceleration at the substrate can be employed to define the deposition energy. This energy usually ranges from a few [[Electronvolt|eV]] up to a few keV.<ref name=":0" /> At low energy molecular ion beams are deposited intact (ion soft landing), while at a high deposition energy molecular ions fragment and atomic ions can penetrate further into the material, a process known as [[ion implantation]].<ref>{{Cite book |last=Yurish |first=Sergey Y. |url=https://books.google.com/books/about/Advances_in_Optics_Reviews_1.html?id=Wgp-DwAAQBAJ&source=kp_book_description |title=Advances in Optics Reviews 1 |date=2018-10-17 |publisher= |isbn=978-0-244-42328-5 |language=en}}</ref> |
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Ion optics (such as radio frequency quadrupoles) can be mass selective. In IBD they are used to select a single, or a range of ion species for deposition in order to avoid contamination. For organic materials in particular, this process is often monitored by a [[mass spectrometer]]. |
Ion optics (such as radio frequency quadrupoles) can be mass selective. In IBD they are used to select a single, or a range of ion species for deposition in order to avoid contamination. For organic materials in particular, this process is often monitored by a [[mass spectrometer]].<ref>{{Cite journal |last=Walz |first=Andreas |last2=Stoiber |first2=Karolina |last3=Huettig |first3=Annette |last4=Schlichting |first4=Hartmut |last5=Barth |first5=Johannes V. |date=2022-06-07 |title=Navigate Flying Molecular Elephants Safely to the Ground: Mass-Selective Soft Landing up to the Mega-Dalton Range by Electrospray Controlled Ion-Beam Deposition |url=https://pubs.acs.org/doi/10.1021/acs.analchem.1c04495 |journal=Analytical Chemistry |language=en |volume=94 |issue=22 |pages=7767–7778 |doi=10.1021/acs.analchem.1c04495 |issn=0003-2700 |pmc=9178560 |pmid=35609119}}</ref> |
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The ion beam current, which is quantitative measure for the deposited amount of material, can be monitored during the deposition process. Switching of the selected mass range can be used to define a [[stoichiometry]]. |
The ion beam current, which is quantitative measure for the deposited amount of material, can be monitored during the deposition process. Switching of the selected mass range can be used to define a [[stoichiometry]].<ref>{{Cite journal |last=Fremdling |first=Paul |last2=Esser |first2=Tim K. |last3=Saha |first3=Bodhisattwa |last4=Makarov |first4=Alexander A. |last5=Fort |first5=Kyle L. |last6=Reinhardt-Szyba |first6=Maria |last7=Gault |first7=Joseph |last8=Rauschenbach |first8=Stephan |date=2022-09-27 |title=A Preparative Mass Spectrometer to Deposit Intact Large Native Protein Complexes |url=https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9527803/ |journal=ACS Nano |volume=16 |issue=9 |pages=14443–14455 |doi=10.1021/acsnano.2c04831 |issn=1936-0851 |pmc=9527803 |pmid=36037396}}</ref> |
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==See also== |
==See also== |
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*[[Electrospray ionization]] |
*[[Electrospray ionization]] |
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*[[MALDI]] |
*[[MALDI]] |
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==References== |
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{{reflist}} |
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[[Category:Thin film deposition]] |
[[Category:Thin film deposition]] |
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Revision as of 20:12, 10 December 2023
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Ion beam deposition (IBD) is a process of applying materials to a target through the application of an ion beam.
An ion beam deposition apparatus typically consists of an ion source, ion optics, and the deposition target. Optionally a mass analyzer can be incorporated.[1]
In the ion source source materials in the form of a gas, an evaporated solid, or a solution (liquid) are ionized. For atomic IBD, electron ionization, field ionization (Penning ion source) or cathodic arc sources are employed.[citation needed] Cathodic arc sources are used particularly for carbon ion deposition. Molecular ion beam deposition employs electrospray ionization or MALDI sources.[2]
The ions are then accelerated, focused or deflected using high voltages or magnetic fields. Optional deceleration at the substrate can be employed to define the deposition energy. This energy usually ranges from a few eV up to a few keV.[2] At low energy molecular ion beams are deposited intact (ion soft landing), while at a high deposition energy molecular ions fragment and atomic ions can penetrate further into the material, a process known as ion implantation.[3]
Ion optics (such as radio frequency quadrupoles) can be mass selective. In IBD they are used to select a single, or a range of ion species for deposition in order to avoid contamination. For organic materials in particular, this process is often monitored by a mass spectrometer.[4]
The ion beam current, which is quantitative measure for the deposited amount of material, can be monitored during the deposition process. Switching of the selected mass range can be used to define a stoichiometry.[5]
See also
- Cathodic arc deposition
- Sputter deposition
- Ion beam assisted deposition
- Ion beam induced deposition
- Electrospray ionization
- MALDI
References
- ^ Stout, D. A.; Durmus, N. G.; Webster, T. J. (1 January 2013), Gaharwar, A. K.; Sant, S.; Hancock, M. J.; Hacking, S. A. (eds.), "5 - Synthesis of carbon based nanomaterials for tissue engineering applications", Nanomaterials in Tissue Engineering, Woodhead Publishing Series in Biomaterials, Woodhead Publishing, pp. 119–157, ISBN 978-0-85709-596-1, retrieved 10 December 2023
- ^ a b Li, Wuxia; Gu, Changzhi (2013), Nee, Andrew (ed.), "Ion Beam Instruments Used for Nanomanufacturing", Handbook of Manufacturing Engineering and Technology, London: Springer, pp. 1–22, doi:10.1007/978-1-4471-4976-7_63-4, ISBN 978-1-4471-4976-7, retrieved 10 December 2023
- ^ Yurish, Sergey Y. (17 October 2018). Advances in Optics Reviews 1. ISBN 978-0-244-42328-5.
- ^ Walz, Andreas; Stoiber, Karolina; Huettig, Annette; Schlichting, Hartmut; Barth, Johannes V. (7 June 2022). "Navigate Flying Molecular Elephants Safely to the Ground: Mass-Selective Soft Landing up to the Mega-Dalton Range by Electrospray Controlled Ion-Beam Deposition". Analytical Chemistry. 94 (22): 7767–7778. doi:10.1021/acs.analchem.1c04495. ISSN 0003-2700. PMC 9178560. PMID 35609119.
- ^ Fremdling, Paul; Esser, Tim K.; Saha, Bodhisattwa; Makarov, Alexander A.; Fort, Kyle L.; Reinhardt-Szyba, Maria; Gault, Joseph; Rauschenbach, Stephan (27 September 2022). "A Preparative Mass Spectrometer to Deposit Intact Large Native Protein Complexes". ACS Nano. 16 (9): 14443–14455. doi:10.1021/acsnano.2c04831. ISSN 1936-0851. PMC 9527803. PMID 36037396.
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