Chemical Vapor Deposition (journal)
 | This article includes a list of references, related reading, or external links, but its sources remain unclear because it lacks inline citations. (October 2015) |
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 | ''Chem. Vap. Deposition'' doesn't exist. |
| ''Chem Vap Deposition'' doesn't exist. |
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| Discipline | Materials science |
|---|---|
| Language | English |
| Edited by | Peter Gregory |
| Publication details | |
| History | 1995-present |
| Publisher | |
| Frequency | Monthly |
| 1.804 (2010) | |
| Standard abbreviations | |
| ISO 4 | 'Chem. Vap. Deposition' |
| Indexing | |
| ISSN | 0948-1907 (print) 1521-3862 (web) |
| Links | |
Chemical Vapor Deposition is a monthly peer-reviewed scientific journal covering materials science. It publishes Reviews, Short Communications, and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information, and book reviews. Frequent topics covered by the journal also include inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films, and ceramic processing.