Thin Solid Films

From Wikipedia, the free encyclopedia
Jump to navigation Jump to search
Thin Solid Films  
Thin Solid Films cover image.gif
DisciplineThin-film synthesis, applied physics
LanguageEnglish
Edited byJ.E. Greene
Publication details
Former name(s)
Symposium on Plasma Science for Materials
History1967-present
Publisher
FrequencyBiweekly
1.939 (2017)
Standard abbreviations
ISO 4Thin Solid Films
Indexing
CODENTHSFAP
ISSN0040-6090
LCCN81005059
OCLC no.1605925
Links

Thin Solid Films is a peer-reviewed scientific journal published 24 times per year by Elsevier. It was established in July 1967. The current editor-in-chief is J.E. Greene (University of Illinois at Urbana–Champaign).

Aims and scope[edit]

The journal covers research on thin-film synthesis, characterization, and applications, including synthesis, surfaces, interfaces, colloidal behavior, metallurgical topics, mechanics (including nanomechanics), electronics, optics, optoelectronics, magnetics, magneto-optics, and superconductivity.

Abstracting and indexing[edit]

The journal is indexed and abstracted in:

According to the Journal Citation Reports, the journal has a 2013 impact factor of 1.867.[1]

References[edit]

  1. ^ "Thin Solid Films". 2013 Journal Citation Reports. Web of Science (Science ed.). Thomson Reuters. 2014.

External links[edit]