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Quantum optical lithography

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Quantum optical lithography (QOL), is a diffraction-unlimited method able to write at 1 nm resolution [1] by optical means, using a red laser diode (λ = 650nm).Complex patterns like geometrical figures and letters were obtained at 3 nm resolution [2] on resist substrate. The method was applied to nanopattern graphene at 20 nm resolution.[3]

  1. ^ Pavel, E; Jinga, S; Vasile, B S; Dinescu, A; Marinescu, V; Trusca, R; Tosa, N (2014). "Quantum Optical Lithography from 1 nm resolution to pattern transfer on silicon wafer". Opt Laser Technol. 60: 80–84. doi:10.1016/j.optlastec.2014.01.016.
  2. ^ Pavel, E; Prodan, G; Marinescu, V; Trusca, R (2019). "Recent advances in 3- to 10-nm quantum optical lithography". J. Micro/Nanolith. MEMS MOEMS. 18 (2): 020501. doi:10.1117/1.JMM.18.2.020501.
  3. ^ Pavel, E; Marinescu, V; Lungulescu, M (2019). "Graphene nanopatterning by Quantum Optical Lithography". Optik. doi:10.1016/j.ijleo.2019.163532.