Talk:Reactive-ion etching

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The second paragraph of the 'Equpiment' section has the following sentence: "Very high plasma densities can be achieved, though etch profiles tend to be more isotropic.". I believe this should be "less isotropic", but only from the sentence, not from my own knowledge. Can anyone weigh in on this one? Larryisgood (talk) 05:53, 20 November 2015 (UTC)

To expand the stub: I added the reference to the corresponding german wikipedia article, which is quite good. Perhaps somebody, who has English as mother tongue, is better able to translate it. -- mchelge 10/19/04

Scheme is false: It is the opposite —Preceding unsigned comment added by (talk) 14:03, 27 July 2009 (UTC)

Yes, I think the plate connected to the RF generator (which is DC isolated) should have a negative potential ! -- Ocwikiver 29/08/09

And the ions have positive charge —Preceding unsigned comment added by (talk) 07:08, 5 November 2009 (UTC)

Very true; the image is wrong. Electron mobility is much greater than ion mobility, which allows the electrode to get negatively charged. See explanation: at page 196 —Preceding unsigned comment added by (talk) 12:46, 4 January 2011 (UTC)

Method of Operation: Wrong explanation and wrong image as said before — Preceding unsigned comment added by (talk) 10:21, 1 February 2012 (UTC)