1.5 µm process

From Wikipedia, the free encyclopedia

This article does not cite any references or sources. Please help improve this article by adding citations to reliable sources. Unsourced material may be challenged and removed. (September 2009)

Semiconductor manufacturing processes

10 µm 3 µm 1.5 µm 1 µm 800 nm (0.80 µm) 600 nm (0.60 µm) 350 nm (0.35 µm) 250 nm (0.25 µm) 180 nm (0.18 µm) 130 nm (0.13 µm) 90 nm 65 nm 45 nm 32 nm (Double Patterning) 22 nm (End of Planar Bulk CMOS) 16 nm (Transition to Nanoelectronics) 11 nm (Nanoelectronics)

The 1.5 µm process (1.5 µm or 1500 nm) process refers to the level of semiconductor process technology that was reached around 1982 timeframe by the leading semiconductor companies, like Intel and IBM.

[edit] Products featuring 1.5 µm manufacturing process

• Intel 80286 CPU launched in 1982 was manufactured using this process.

Preceded by 3 µm process

CMOS manufacturing processes

Succeeded by 1 µm process