Talk:Maskless lithography

This is the talk page for discussing improvements to the Maskless lithography article.
This is not a forum for general discussion of the article's subject.

Put new text under old text. Click here to start a new topic.
New to Wikipedia? Welcome! Learn to edit; get help.

Article policies

Find sources: Google (books · news · scholar · free images · WP refs) · FENS · JSTOR · TWL

The Wikimedia Foundation's Terms of Use require that editors disclose their "employer, client, and affiliation" with respect to any paid contribution; see WP:PAID. For advice about reviewing paid contributions, see WP:COIRESPONSE.

Quantum quirrell (talk · contribs) has been paid by SwissLitho (Heidelberg Instruments) on their behalf.

Edit request

It is requested that edits be made to the following semi-protected pages:

This template must be followed by a complete and specific description of the request, that is, specify what text should be removed and a verbatim copy of the text that should replace it. "Please change X" is not acceptable and will be rejected; the request must be of the form "please change X to Y".

The edit may be made by any autoconfirmed user. Remember to change the |answered=no parameter to "yes" when the request has been accepted, rejected or on hold awaiting user input. This is so that inactive or completed requests don't needlessly fill up the edit requests category. You may also wish to use the {{ESp}} template in the response. To request that a page be protected or unprotected, make a protection request.

The section on probe-based maskless lithography is missing information.

Since I am affiliated to a company making tools for thermal probe nanolithography, I only suggest the following edit

Scanning Probe Lithography

Scanning probes, or AFM-tips, can be also used to pattern or modify materials. For example:

Due to a wider range of tip-sample interaction forces, scanning probe lithography can be used both for nanopatterning^[1]^[2]^[3] and device fabrication as well as for inducing local chemical^[4] or physical changes^[5].

Quantum quirrell (talk) 15:25, 6 August 2019 (UTC)[reply]

References

^ Yan, Yongda; Hu, Zhenjiang; Zhao, Xueshen; Sun, Tao; Dong, Shen; Li, Xiaodong (2010). "Top-Down Nanomechanical Machining of Three-Dimensional Nanostructures by Atomic Force Microscopy". Small. 6 (6): 724–728. doi:10.1002/smll.200901947. ISSN 1613-6829.|quote=When the AFM tip is in contact with the sample surface at a small normal/contact load Fz(Figure 2a), the sample surface beneath the AFM tip deforms elastically and the Hertz contact theory can be used to analyzesuch contact stress. Once Fz is increased to the yield stress of the sample material, plastic deformation occurs beneath the AFM tip. Then the AFM tip scratches the sample surface along they-direction and a groove forms accordingly
^ Zhang, Yi; Berger, Rüdiger; Butt, Hans-Jürgen (2012), Bhushan, Bharat (ed.), "Dip-Pen Nanolithography", Encyclopedia of Nanotechnology, Springer Netherlands, pp. 565–572, doi:10.1007/978-90-481-9751-4_282, ISBN 9789048197514, retrieved 2019-08-06, Ink molecules transport from coated tip to solid substrate driven by a capillary force. ... By depositing ink molecules to surfaces, DPN has the ability to create architectures with controlled chemical composition and physical structure. One approach is to write inorganic ink materials that are dispersed in a solvent by DPN. Then the solvent will be removed from the patterned features by post-DPN treatments such as heating or light curing, resulting in well-defined hard inorganic nanostructures
^ Leuthold, Juerg; Luisier, Mathieu; Andermatt, Samuel; Fedoryshyn, Yuriy; Ma, Ping; Ducry, Fabian; Salamin, Yannick; Emboras, Alexandros; Cheng, Bojun (2019-03-07). "Ultra compact electrochemical metallization cells offering reproducible atomic scale memristive switching". Communications Physics. 2 (1): 1–9. doi:10.1038/s42005-019-0125-9. ISSN 2399-3650. The ultra-sharp tip of Ag is patterned with the help of thermal-scanning probe lithography24,25,26 (t-SPL). The thermal-scanning tip typically has a 3 nm radius27. The thermal lithography transfers the 3D profile of the ultra-sharp thermal-scanning tip into the pattern transfer layer of PPA (polyphthalaldehyde) and subsequently into SiO2.
^ Riedo, Elisa; Sheehan, Paul E.; Heer, Walter A. de; King, William P.; Berger, Claire; Marder, Seth R.; Dai, Zhenting; Laracuente, Arnaldo R.; Yakes, Michael K. (2010-06-11). "Nanoscale Tunable Reduction of Graphene Oxide for Graphene Electronics". Science. 328 (5984): 1373–1376. doi:10.1126/science.1188119. ISSN 0036-8075. PMID 20538944. Arbitrary rGO features such as a cross (Fig. 1)or squares (Fig. 2) are reliably obtained by scanning the heated AFM tip over isolated GO flakes on a SiOx/Si substrate. The thermal reduction decreases the 9.5±1.9 Å height of the sheet by 2-5 Å, as obtained from the topography image(Fig. 1 and fig. S6). Two effects could lead to height reduction. One is the loss of oxygen-rich functional groups from the GO flake surface. Given that scanning an unheated tip does not result in height changes, this loss is primarily caused by intrinsic chemical conversion rather than mechanical removal.
^ Bertacco, Riccardo; Riedo, Elisa; Raabe, Jörg; Zheng, Xiaorui; Calò, Annalisa; Sebastian Wintz; Finizio, Simone; Tacchi, Silvia; Silvani, Raffaele (2018-09-20). "Nanoscale spin-wave circuits based on engineered reconfigurable spin-textures". Communications Physics. 1 (1): 1–8. doi:10.1038/s42005-018-0056-x. ISSN 2399-3650. Different spin-textures were patterned in an exchange bias ferromagnet/antiferromagnet bilayer (Fig. 1a), by sweeping a heated scanning probe in an external magnetic field for setting the unidirectional magnetic anisotropy strength and direction in the ferromagnetic film.

Reply 6-AUG-2019

Clarification requested

In order to better process your request, please place the verbatim text from the provided sources under the |quote= parameter of each citation's template. Only text which directly verifies the requested claims should be placed under this parameter. This text ought to constitute only the minimum amount needed to verify the claims (one or two sentences maximum per reference).
When ready to proceed with the requested information, kindly change the {{request edit}} template's answer parameter to read from |ans=yes to |ans=no. Thank you!

Regards, Spintendo 16:30, 6 August 2019 (UTC)[reply]

Thanks a lot for the detailed explanation of how to add verification text. Please let me know if you have further questions.

Quantum quirrell (talk) 14:06, 9 August 2019 (UTC)[reply]

Reply 9-AUG-2019

Edit request declined

In each instance where the requested text which verifies the proposed text was asked to be added via the quote parameter, only the first sentence of each article has been added.^[a]
The request was to add the precise text from the provided sources which verifies the proposed text. As the sentence states Due to a wider range of tip-sample interaction forces, scanning probe lithography can be used both for nanopatterning and device fabrication as well as for inducing local chemical or physical changes. Ostensibly, the quoted text from the provided sources should state how and in what way each lithography technique is able to accomplish the sort of nonopatterning, device fabrication, and local chemical and physical changes described in the proposed text.

Regards, Spintendo 16:09, 9 August 2019 (UTC)[reply]

Notes

^ In all four instances, only text from the article's abstract sections were provided. While giving some essence of the conclusions of the reports, an article's absract section only provides a brief summary, and does not contain the "meat" of the article in full form, as it were. For example, in one abstract it states "we introduce a new technology relying on sharp three-dimensional (3D) metal tips that allows for the reliable relocation of few atoms in both volatile and non-volatile ECM Cells." What this abstract does not detail that the full article does, is how 3D metal tips allow for the "reliable relocation of few atoms in both volatile and non-volatile ECM Cells". In another abstract it states "In this work, we demonstrate the fundamental building blocks of spin-waves circuitry" and yet that demonstration — which is the "meat" of the article, and arguably what makes or breaks the article as a sound source to use in the maskless lithography Wikipedia article — is not described in the abstract.

===Reply 13-AUG-2019===

Thanks for your feedback. Added more substantial quotes to the references.

Best, Quantum quirrell (talk) 15:21, 13 August 2019 (UTC)[reply]

[1] Yan, Yongda; Hu, Zhenjiang; Zhao, Xueshen; Sun, Tao; Dong, Shen; Li, Xiaodong (2010). "Top-Down Nanomechanical Machining of Three-Dimensional Nanostructures by Atomic Force Microscopy". Small. 6 (6): 724–728. doi:10.1002/smll.200901947. ISSN 1613-6829.|quote=When the AFM tip is in contact with the sample surface at a small normal/contact load Fz(Figure 2a), the sample surface beneath the AFM tip deforms elastically and the Hertz contact theory can be used to analyzesuch contact stress. Once Fz is increased to the yield stress of the sample material, plastic deformation occurs beneath the AFM tip. Then the AFM tip scratches the sample surface along they-direction and a groove forms accordingly

[2] Zhang, Yi; Berger, Rüdiger; Butt, Hans-Jürgen (2012), Bhushan, Bharat (ed.), "Dip-Pen Nanolithography", Encyclopedia of Nanotechnology, Springer Netherlands, pp. 565–572, doi:10.1007/978-90-481-9751-4_282, ISBN 9789048197514, retrieved 2019-08-06, Ink molecules transport from coated tip to solid substrate driven by a capillary force. ... By depositing ink molecules to surfaces, DPN has the ability to create architectures with controlled chemical composition and physical structure. One approach is to write inorganic ink materials that are dispersed in a solvent by DPN. Then the solvent will be removed from the patterned features by post-DPN treatments such as heating or light curing, resulting in well-defined hard inorganic nanostructures

[3] Leuthold, Juerg; Luisier, Mathieu; Andermatt, Samuel; Fedoryshyn, Yuriy; Ma, Ping; Ducry, Fabian; Salamin, Yannick; Emboras, Alexandros; Cheng, Bojun (2019-03-07). "Ultra compact electrochemical metallization cells offering reproducible atomic scale memristive switching". Communications Physics. 2 (1): 1–9. doi:10.1038/s42005-019-0125-9. ISSN 2399-3650. The ultra-sharp tip of Ag is patterned with the help of thermal-scanning probe lithography24,25,26 (t-SPL). The thermal-scanning tip typically has a 3 nm radius27. The thermal lithography transfers the 3D profile of the ultra-sharp thermal-scanning tip into the pattern transfer layer of PPA (polyphthalaldehyde) and subsequently into SiO2.

[4] Riedo, Elisa; Sheehan, Paul E.; Heer, Walter A. de; King, William P.; Berger, Claire; Marder, Seth R.; Dai, Zhenting; Laracuente, Arnaldo R.; Yakes, Michael K. (2010-06-11). "Nanoscale Tunable Reduction of Graphene Oxide for Graphene Electronics". Science. 328 (5984): 1373–1376. doi:10.1126/science.1188119. ISSN 0036-8075. PMID 20538944. Arbitrary rGO features such as a cross (Fig. 1)or squares (Fig. 2) are reliably obtained by scanning the heated AFM tip over isolated GO flakes on a SiOx/Si substrate. The thermal reduction decreases the 9.5±1.9 Å height of the sheet by 2-5 Å, as obtained from the topography image(Fig. 1 and fig. S6). Two effects could lead to height reduction. One is the loss of oxygen-rich functional groups from the GO flake surface. Given that scanning an unheated tip does not result in height changes, this loss is primarily caused by intrinsic chemical conversion rather than mechanical removal.

[5] Bertacco, Riccardo; Riedo, Elisa; Raabe, Jörg; Zheng, Xiaorui; Calò, Annalisa; Sebastian Wintz; Finizio, Simone; Tacchi, Silvia; Silvani, Raffaele (2018-09-20). "Nanoscale spin-wave circuits based on engineered reconfigurable spin-textures". Communications Physics. 1 (1): 1–8. doi:10.1038/s42005-018-0056-x. ISSN 2399-3650. Different spin-textures were patterned in an exchange bias ferromagnet/antiferromagnet bilayer (Fig. 1a), by sweeping a heated scanning probe in an external magnetic field for setting the unidirectional magnetic anisotropy strength and direction in the ferromagnetic film.

[6] In all four instances, only text from the article's abstract sections were provided. While giving some essence of the conclusions of the reports, an article's absract section only provides a brief summary, and does not contain the "meat" of the article in full form, as it were. For example, in one abstract it states "we introduce a new technology relying on sharp three-dimensional (3D) metal tips that allows for the reliable relocation of few atoms in both volatile and non-volatile ECM Cells." What this abstract does not detail that the full article does, is how 3D metal tips allow for the "reliable relocation of few atoms in both volatile and non-volatile ECM Cells". In another abstract it states "In this work, we demonstrate the fundamental building blocks of spin-waves circuitry" and yet that demonstration — which is the "meat" of the article, and arguably what makes or breaks the article as a sound source to use in the maskless lithography Wikipedia article — is not described in the abstract.

[1]

[2]

[3]

[4]

[5]

[a]