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Buffered oxide etch: Revision history


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  • curprev 18:0618:06, 29 June 2007Sarosh talk contribs 133 bytes +133 Created page with 'Buffered oxide etch is a mixture of [[NH<sub>4</sub>F]] and HF used to isotropically etch [[SiO<sub>2</sub>]] in microfabrication'